Prof. Samukawa received the IEEE Nano 2016 Best paper award
Prof. Seiji Samukawa received the Best Paper Award of the IEEE 16th International Conference on Nanotechnology (IEEE Nano 2016).
The award winning paper is “Defect-Free Germanium Etching for 3D Fin MOSFET Using Neutral Beam Etching.”
Osamu Shimizu, Tomohide Wada
PR & Outreach office, Advanced Institute for Materials Research (AIMR), Tohoku University